Ben Jarashow
About Ben Jarashow
Ben Jarashow is a Lead Naval Architect with over two decades of experience in the naval architecture industry, currently working at ECS in Silver Spring, MD. He has held various positions in both public and private sectors, including roles at Gibbs & Cox, CSRA Inc, and CSC Advanced Marine.
Current Role at ECS
Ben Jarashow serves as the Lead Naval Architect at ECS, a position he has held since 2019. He is based in Silver Spring, MD. In this role, he supports the NOAA Office of Marine and Aviation Operations Platform Acquisition Division. His responsibilities include overseeing naval architecture projects and ensuring the effective design and implementation of marine systems.
Previous Experience at Gibbs & Cox, Inc.
Prior to his current role, Ben worked at Gibbs & Cox, Inc. as a Principal Naval Architect from 2018 to 2019. His tenure lasted one year and took place in the Washington D.C. Metro Area. In this position, he contributed to various naval architecture projects, leveraging his extensive expertise in the field.
Experience at CSRA Inc.
Ben Jarashow was employed at CSRA Inc. as a Senior Naval Architect from 2017 to 2018. His role lasted one year and was also based in the Washington D.C. Metro Area. During this time, he applied his skills in naval architecture to support various initiatives within the organization.
Educational Background in Naval Architecture
Ben studied Naval Architecture & Marine Engineering at the University of Michigan, where he earned a Bachelor of Science in Engineering (B.S.E.) from 1996 to 2000. This educational foundation has equipped him with the technical knowledge and skills necessary for a successful career in naval architecture.
Career in Naval Architecture
With over two decades of experience in the naval architecture industry, Ben Jarashow has worked in both public and private sectors. His previous roles include Project Naval Architect at CSC Advanced Marine from 2010 to 2016, where he engaged in various projects that enhanced his expertise in the field.