Eric Hostetler
About Eric Hostetler
Eric Hostetler is a Senior Research Engineer at ENTEK International, where he has worked since 2014. He holds a Bachelor of Science and a Master of Science in Chemical Engineering from Oregon State University and has expertise in semiconductor processing and materials characterization.
Work at ENTEK International
Eric Hostetler has been employed at ENTEK International since 2014, initially serving as a Research Engineer for five years before advancing to the position of Senior Research Engineer in 2019. He has accumulated a decade of experience at the company's Lebanon, OR location. In his role, he focuses on research and development, leveraging his expertise in materials processing and characterization.
Education and Expertise
Eric Hostetler holds a Bachelor of Science (BS) in Chemical Engineering from Oregon State University, which he completed from 2005 to 2010. He furthered his education by obtaining a Master of Science (MS) in Chemical Engineering from the same institution, graduating in 2013. His academic background includes extensive coursework in semiconductor processing and materials characterization.
Research Experience at Oregon State University
Prior to his tenure at ENTEK International, Eric Hostetler worked at Oregon State University in various research roles. He served as a Graduate Research Assistant from 2012 to 2014, where he conducted research on the effects of process conditions on PbSe quantum dot size, composition, and morphology. He also held the position of Research Assistant from 2010 to 2012, contributing to various projects in the Corvallis, Oregon area.
Innovations and Patents
Eric Hostetler developed a microwave-assisted flow reactor for the synthesis of nanomaterials, which is currently under U.S. Patent Application No. 61/921,229. This innovation reflects his commitment to advancing research in nanomaterials and highlights his technical skills in engineering and design.
Technical Skills and Instrumentation
Eric Hostetler possesses extensive experience with a variety of analytical instruments, including Secondary Ion Mass Spectroscopy (SIMS), X-ray Diffraction (XRD), and Atomic Force Microscopy (AFM). His expertise in the processing and characterization of thin films, particularly regarding thermal oxidation and diffusion in sputter deposited metallic glass thin films, enhances his contributions to research and development.