Clayton Shallcross

Lead R&D Scientist, Capacitors @ General Atomics

About Clayton Shallcross

Clayton Shallcross is the Lead R&D Scientist for Capacitors at General Atomics, where he has worked since 2020. He has extensive experience in research and development, having previously held positions at The University of Arizona and the University of Cologne.

Current Role at General Atomics

Clayton Shallcross serves as the Lead R&D Scientist in the Capacitors division at General Atomics since 2020. In this role, he focuses on the design and development of dielectric materials and films aimed at enhancing the energy density of next-generation capacitors. He manages a team that includes technicians, scientists, and engineers, overseeing research, development, and engineering activities within the laboratory.

Previous Experience at The University of Arizona

Before joining General Atomics, Clayton Shallcross worked at The University of Arizona in various capacities from 2003 to 2014. He served as a Graduate Research Assistant for six years, followed by a year as a Postdoctoral Researcher. From 2015 to 2020, he held the position of Research Scientist, contributing to projects in the Tucson, Arizona area.

Fellowship at University of Cologne

Clayton Shallcross was a National Science Foundation IRFP Fellow at the University of Cologne from 2009 to 2013. During this four-year fellowship, he engaged in research that contributed to his expertise in analytical chemistry and related fields.

Educational Background in Chemistry

Clayton Shallcross earned a PhD in Analytical Chemistry from the University of Arizona, where he studied from 2003 to 2009. His research focused on electrochemistry, OLED/OPV, nanocrystal synthesis, optics, photoelectron spectroscopy, and microscopy. Prior to this, he obtained a B.S. in Chemistry from The University of Texas at Austin, completing his studies from 1998 to 2003.

Research and Development Expertise

Clayton Shallcross specializes in developing methodologies for characterizing and comparing dielectric materials and films used in capacitor designs. His work is integral to advancing the technology of capacitors, particularly in enhancing their energy density through innovative material design.

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