Haibo Huang
About Haibo Huang
Haibo Huang is a Scientist IX at General Atomics, recognized for his contributions to materials science, including the discovery of anomalous copper diffusion in beryllium samples and the development of advanced imaging and measurement techniques. He holds a Ph.D. in Physics and Materials Science from Harvard University and has over two decades of experience in the field.
Current Role at General Atomics
Currently, Haibo Huang serves as Scientist IX at General Atomics, a position he has held since 2002. In this role, he has managed a plasma modeling project focused on understanding the magnetron sputtering process through computer modeling. This project aims to develop a predictive tool for coating development and process optimization. Huang has also implemented a high-definition atomic force microscopy (HD-AFM) system, enhancing the characterization of new HDC capsules at 25 times higher resolution. His contributions to the organization include coordinating cleanroom upgrades and serving as a liaison to Lawrence Livermore National Laboratory (LLNL) for dust mitigation and inspection techniques.
Previous Experience at Corning Inc
Before joining General Atomics, Haibo Huang worked as a Senior Scientist at Corning Inc from 1998 to 2001. During his tenure, he developed a spheremapper equipped with a robotic batch loader, which facilitated batch measurement of NIF capsules. His work at Corning Inc contributed to advancements in measurement techniques and enhanced the efficiency of capsule assessments.
Education and Expertise
Haibo Huang holds a Ph.D. and A.M. in Physics and Materials Science from Harvard University, where he studied from 1991 to 1998. Prior to that, he earned an A.B. in Physics from Fudan University, completing his studies there from 1987 to 1991. His educational background has equipped him with a strong foundation in scientific research and materials characterization, which he has applied throughout his career.
Research Contributions and Innovations
Huang has made significant contributions to the field of materials science and engineering. He discovered anomalous copper diffusion in sputtered beryllium samples and devised practical solutions to address this issue. He developed a quantitative radiography technique for non-destructive profiling of dopant distributions in opaque ICF capsules, meeting stringent NIF specifications. Additionally, he collaborated with Beneq Oy to design an atomic layer deposition (ALD) system for high aspect ratio samples, demonstrating his commitment to advancing technological capabilities.
Technical Developments and Improvements
Throughout his career, Haibo Huang has focused on enhancing various technical systems and processes. He improved the grayscale sensitivity of a commercial x-ray imaging microscope from approximately 2% to 0.3%. He also fabricated ablator shells with controlled gas permeation half-life and developed new high-z foams and micro-fluidic chips, achieving a 40 times longer device lifetime. His work on the Phase Shifting Diffraction Interferometer (PSDI) system has also contributed to the quantification of surface defects.