Samuel Williams
About Samuel Williams
Samuel Williams is a College Tech Specialist at Lockheed Martin, where he has worked since 2019. He has a background in aerospace engineering from Georgia Institute of Technology and has held various roles in research and engineering, including internships and positions at Delta Air Lines and Navatek, Ltd.
Work at Lockheed Martin
Samuel Williams has been employed at Lockheed Martin as a College Tech Specialist since 2019. His role is based in Newport, Rhode Island, where he has accumulated five years of experience. In this position, he applies his knowledge in aerospace engineering and technical skills to support various projects and initiatives within the company.
Previous Experience
Prior to his current role, Samuel Williams held several positions that contributed to his professional development. He worked as an Undergraduate Research Assistant at the Georgia Institute of Technology for four months in 2019, during which he was based in Lorraine, France. In 2020, he served as a Performance Engineer at Delta Air Lines for four months in Atlanta, Georgia. Additionally, he completed a Software Engineering Internship at Navatek, Ltd. for three months in 2018 in Wakefield, Rhode Island.
Education and Expertise
Samuel Williams studied at Georgia Institute of Technology, where he earned a Bachelor of Science degree in Aerospace Engineering from 2017 to 2022. Prior to that, he completed his high school education at The Prout School, obtaining his High School Diploma from 2013 to 2017. He possesses expertise in various technical areas, including CAD design, 3D printing, software programming, electrical testing, and woodworking.
Career Aspirations
Samuel Williams is actively seeking an internship to gain practical aerospace experience and enhance his technical skills. He aims to further develop his capabilities in the aerospace field, leveraging his strong math and engineering background. His self-starting and determined work ethic positions him well for future opportunities in the industry.