Jeffrey Clayhold
About Jeffrey Clayhold
Jeffrey Clayhold is a Principal Engineer at ON Semiconductor and an Assistant Professor of Physics at Miami University. He has made significant contributions to materials characterization and failure analysis over his extensive career in engineering and academia.
Work at Onsemi
Jeffrey Clayhold has served as a Principal Engineer at ON Semiconductor since 2010. His role is based in the Rochester, New York area, where he has contributed for over 14 years. During his tenure, he has developed specialized pulse measurement techniques that enhance the accuracy of thermoelectric effects characterization in materials. Additionally, he created a rapid failure analysis system that efficiently identifies DC shorts across entire wafer runs. His work has led to significant advancements in materials characterization, including achieving picovolt resolution measurements of the Nernst effect.
Education and Expertise
Jeffrey Clayhold holds a Ph.D. in Physics from Princeton University, where he studied from 1984 to 1989. He also earned a B.S. with Honors in Physics from Caltech, completing his studies there from 1980 to 1984. His academic background provides a strong foundation for his research and engineering work. He has expertise in areas such as ion implantation for electrical conduction characterization, statistical characterization methods for quality control, and thermal characterization for NASA simulations.
Background
In addition to his engineering role at ON Semiconductor, Jeffrey Clayhold has been an assistant professor of physics at Miami University since 2004. This position has allowed him to engage in academia while contributing to research and development in the semiconductor industry. He is fluent in German and French, alongside his native English, which enhances his communication skills in diverse environments.
Achievements
Throughout his career, Jeffrey Clayhold has pioneered several advancements in materials science and engineering. He has produced and studied polarized Rn nuclei for the first time and developed new statistical methods for the quality control of complex oxide thin films grown by molecular beam epitaxy. His innovative approaches have significantly impacted the characterization processes in the semiconductor field.