Art Calderon
About Art Calderon
Art Calderon is a SEM/Process Characterization Lab Technician at Skorpios Technologies, Inc., where he has worked since 2017. He has extensive experience in the semiconductor industry, having held various technical roles at companies such as AMD, CYPRESS SEMICONDUCTOR CORPORATION, and EXTREME DEVICES.
Work at Skorpios Technologies
Art Calderon has been employed at Skorpios Technologies, Inc. as a SEM/Process Characterization Lab Technician since 2017. In this role, he collaborates directly with engineers and customers to provide essential information for pre and postproduction quality control. His responsibilities include high-resolution surface imaging and surface composition analysis, contributing to the overall quality of the products developed by the company.
Previous Experience in Semiconductor Industry
Before joining Skorpios Technologies, Art Calderon accumulated extensive experience in the semiconductor industry. He worked at AMD as a Wafer Fab Technician from 1993 to 1998. He then transitioned to Extreme Devices as a Research and Development Technician from 1998 to 2003. Following this, he served as an Analytical Services Technician at SVTC from 2004 to 2008, and as a Research and Development Technician at Cypress Semiconductor Corporation for 9 months in 2004.
Technical Support Experience
Art Calderon has also worked in technical support roles. He was a Technical Support Specialist at Protect America from 2009 to 2010. Additionally, he served as a Sales Representative at Transworld Systems for 5 months in 2009. These positions provided him with valuable experience in customer interaction and technical problem-solving.
Education and Expertise
Art Calderon studied at the Southwest Institute of Technology, where he earned an Associate's degree in Electrical, Electronics, and Communications Engineering. His educational background supports his technical expertise in semiconductor processes and characterization techniques, including etch verification and thickness/feature measurements using Focus Ion Beam and SEM analysis.