GenISys
GenISys develops, markets, and supports software solutions for optimizing lithography and inspection in nano fabrication processes, with products like BEAMER and ProSEM widely used in major nano-fabrication centers worldwide.
Services
GenISys provides advanced software solutions for optimizing lithography and inspection processes in nano fabrication. This includes software for e-beam lithography, such as data preparation, fracturing, PEC, and process correction. Additionally, GenISys offers lithography 3D simulation software for a range of technologies including projection stepper, proximity aligner, laser, and e-beam, alongside contour-based pattern metrology software that automates SEM image acquisition.
Products
GenISys offers a suite of products designed to enhance the lithography and inspection processes. BEAMER, introduced in 2006, has become the standard for e-beam direct write pattern processing. TRACER is also widely used for advanced process optimization. LAB, a 3D lithography simulation software, is essential for the flat panel display industry. MASKER provides high-quality mask data preparation, addressing non-Manhattan layout handling and advanced proximity/process correction. ProSEM, launched in 2017, offers metrology and inspection solutions with advanced contour detection and automated SEM image acquisition.
Lithography Software Solutions
GenISys specializes in software solutions that extend the capabilities of various lithography technologies. Their offerings include software for electron- and laser-beam lithography exposure, process correction for gray-scale laser lithography, and Monte Carlo simulation for electron beam PEC process calibration. Their platform supports layout and process optimization for common lithography technologies, quantifying electron scattering and process effects, and providing solutions for mask data preparation (MDP) and mask process correction (MPC).
Metrology and Inspection
GenISys enhances metrology and inspection processes through its advanced software. ProSEM is a key product that provides versatile, consistent offline analysis for SEM images, with capabilities for automated image acquisition and advanced contour detection. This software improves the utilization of SEM equipment, facilitating thorough and efficient pattern and process metrology. GenISys’s offerings address the needs for automated SEM-based pattern and process evaluations, ensuring high precision and reliability.